JPH0360913B2 - - Google Patents
Info
- Publication number
- JPH0360913B2 JPH0360913B2 JP24220783A JP24220783A JPH0360913B2 JP H0360913 B2 JPH0360913 B2 JP H0360913B2 JP 24220783 A JP24220783 A JP 24220783A JP 24220783 A JP24220783 A JP 24220783A JP H0360913 B2 JPH0360913 B2 JP H0360913B2
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- heat
- resistant container
- source device
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001704 evaporation Methods 0.000 claims description 35
- 230000008020 evaporation Effects 0.000 claims description 34
- 239000000463 material Substances 0.000 claims description 12
- 238000010894 electron beam technology Methods 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 description 10
- 239000002184 metal Substances 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 230000008018 melting Effects 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24220783A JPS60135566A (ja) | 1983-12-23 | 1983-12-23 | 斜め方向に指向性を有する蒸発源装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24220783A JPS60135566A (ja) | 1983-12-23 | 1983-12-23 | 斜め方向に指向性を有する蒸発源装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60135566A JPS60135566A (ja) | 1985-07-18 |
| JPH0360913B2 true JPH0360913B2 (en]) | 1991-09-18 |
Family
ID=17085841
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24220783A Granted JPS60135566A (ja) | 1983-12-23 | 1983-12-23 | 斜め方向に指向性を有する蒸発源装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60135566A (en]) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2618516B2 (ja) * | 1990-04-18 | 1997-06-11 | シャープ株式会社 | 薄膜ｅｌ素子の製造方法 |
| JPH0449668U (en]) * | 1990-08-31 | 1992-04-27 | ||
| KR101076227B1 (ko) * | 2008-12-23 | 2011-10-26 | 주식회사 테스 | 진공증착장치 |
-
1983
- 1983-12-23 JP JP24220783A patent/JPS60135566A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60135566A (ja) | 1985-07-18 |
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